Hydrogenated Microcrystalline Silicon Film Growth by Inductively Coupled Plasma–Chemical Vapor Deposition on ZrO2Gate Dielectric for Thin Film Transistors-Reference-Cited by-同舟云学术

Hydrogenated Microcrystalline Silicon Film Growth by Inductively Coupled Plasma–Chemical Vapor Deposition on ZrO2Gate Dielectric for Thin Film Transistors

Published:2006-05-25 Issue:5B Volume:45 Page:4365-4369
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Han Chang-Wook,Park Joong-Hyun,Han Sang-Myeon,Han Min-Koo,Kim Ki-Yong,Chung In-Jae,Yun Sun Jin,Lim Jung Wook

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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