Low Temperature Deposition and Crystallization of Silicon Film on an HF-Etched Polycrystalline Yttria-Stabilized Zirconia Layer Rinsed with Ethanol Solution-Reference-Cited by-同舟云学术

Low Temperature Deposition and Crystallization of Silicon Film on an HF-Etched Polycrystalline Yttria-Stabilized Zirconia Layer Rinsed with Ethanol Solution

Published:2009-03-27 Issue: Volume:2 Page:041201
ISSN:1882-0778
Container-title:Applied Physics Express
language:en
Short-container-title:Appl. Phys. Express

Author:

Horita Susumu,Sukreen Hana

Publisher

IOP Publishing

Subject

General Physics and Astronomy,General Engineering

Link

http://stacks.iop.org/1882-0786/2/i=4/a=041201/pdf

Reference9 articles.

1. Hydrogenated Microcrystalline Silicon Film Growth by Inductively Coupled Plasma–Chemical Vapor Deposition on ZrO2Gate Dielectric for Thin Film Transistors

2. Low temperature μc-Si film growth using a CaF2 seed layer

3. The properties of fluoride/glass and fluoride/silicon

4. Heteroepitaxial Si films on yttria‐stabilized, cubic zirconia substrates

5. Heteroepitaxial Growth of Yttria-Stabilized Zirconia Film on Silicon by Reactive Sputtering

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