Evolution of a-Si:H to nc-Si:H transition of hydrogenated silicon films deposited by trichlorosilane using principle component analysis of optical emission spectroscopy-Reference-Cited by-同舟云学术

Evolution of a-Si:H to nc-Si:H transition of hydrogenated silicon films deposited by trichlorosilane using principle component analysis of optical emission spectroscopy

Published:2020-01 Issue: Volume:240 Page:122186
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Wang Song-Ho,Chang Hsueh-Er,Lee Chien-Chieh,Fuh Yiin-Kuen^ORCID,Li Tomi T.

Funder

Shihlien Chemical Industrial, Inc

Department of Mechanical Engineering, Optical Science Center and Department of Optics and Photonics, National Central University

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference59 articles.

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