Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/1/i=4/a=047001/pdf
Reference29 articles.
1. Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance
2. Line-edge roughness in sub-0.18-μm resist patterns
3. Factors contributing to sidewall roughness in a positive-tone, chemically amplified resist exposed by x-ray lithography
4. Resist line edge roughness and aerial image contrast
5. Proton and anion distribution and line edge roughness of chemically amplified electron beam resist
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