Electron Energy Loss Processes in Methyl Methacrylate: Excitation and Bond Breaking
Author:
Affiliation:
1. J. Heyrovský Institute of Physical Chemistry of CAS, Dolejškova 3, 18223 Prague, Czech Republic
Funder
Ministerstvo ?kolstv?, Ml?de?e a Telov?chovy
Grantov? Agentura Cesk? Republiky
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpca.2c09077
Reference69 articles.
1. Photolithography with polymethyl methacrylate (PMMA)
2. Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist
3. Investigation of correlative parameters to evaluate EUV lithographic performance of PMMA
4. Crosslinked PMMA as a high-resolution negative resist for electron beam lithography and applications for physics of low-dimensional structures
5. Negative PMMA as a high-resolution resist - the limits and possibilities
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