Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist

Published:2017-10-17 Issue:45 Volume:28 Page:455301
ISSN:0957-4484
Container-title:Nanotechnology
language:
Short-container-title:Nanotechnology

Author:

Carbaugh Daniel J,Pandya Sneha G,Wright Jason T,Kaya Savas,Rahman Faiz

Publisher

IOP Publishing

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Mechanics of Materials,General Materials Science,General Chemistry,Bioengineering

Link

http://iopscience.iop.org/article/10.1088/1361-6528/aa8bd5/pdf

Reference37 articles.

1. Lithographic Imaging Techniques for the Formation of Nanoscopic Features

2. Projection optical lithography

3. Extending optics to 50 nm and beyond with immersion lithography

4. Lithography enabling for the 65 nm node gate layer patterning with alternating PSM

5. Stochastic resist patterning simulation using attenuated PSM for EUV lithography

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Emerging II-VI wide bandgap semiconductor device technologies;Physica Scripta;2024-01-05

2. Electron Energy Loss Processes in Methyl Methacrylate: Excitation and Bond Breaking;The Journal of Physical Chemistry A;2023-03-17

3. Recent research progress of master mold manufacturing by nanoimprint technique for the novel microoptics devices;Frontiers of Materials Science;2022-09

4. New microscopic approach to e-beam lithography simulation;2020 International Conference on Information Technology and Nanotechnology (ITNT);2020-05-26

5. A review of polymethyl methacrylate (PMMA) as a versatile lithographic resist – With emphasis on UV exposure;Microelectronic Engineering;2020-03

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3