Influence of Energetic Particles on ZnO Films in the Preparation by Planar Magnetron Sputtering with Obliquely Facing Targets
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. The measurement and impact of negative oxygen ions during reactive sputter deposition;Critical Reviews in Solid State and Materials Sciences;2023-09-21
2. Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films;Plasma Sources Science and Technology;2013-04-03
3. Effect of metal mode and oxide mode on unusual c-axis parallel oriented ZnO film growth on Al/glass substrate in a reactive magnetron sputtering of Zn target;Journal of Crystal Growth;2013-01
4. Unusual growth of polycrystalline oxide film induced by negative ion bombardment in the capacitively coupled plasma deposition;Applied Physics Letters;2012-12-03
5. Quantitative analysis of the effect of energetic particle bombardment during deposition on (1120) texture formation in ZnO films;2011 IEEE International Ultrasonics Symposium;2011-10
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