Effects of Fresnel Diffraction on Resolution and Linewidth Control in Synchrotron Radiation Lithography-Reference-Cited by-同舟云学术

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Effects of Fresnel Diffraction on Resolution and Linewidth Control in Synchrotron Radiation Lithography

Published:1992-03-15 Issue:Part 1, No. 3 Volume:31 Page:938-944
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Somemura Yoh,Deguchi Kimiyoshi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Simulation for Submicron 3D-Structures based on Plane-pattern to the Cross-section Transfer (PCT) Technique;IEEJ Transactions on Sensors and Micromachines;2006

3. Fabrication of submicron three-dimensional structure by plane-pattern to the cross-section transfer method using synchrotron radiation lithography;SPIE Proceedings;2005-12-28

4. Stress Stability of W–Ti X-Ray Absorber in Patterning Process;Japanese Journal of Applied Physics;1999-12-30

5. Extendibility of synchrotron radiation lithography to the sub-100 nm region;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11

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