Simulation for Submicron 3D-Structures based on Plane-pattern to the Cross-section Transfer (PCT) Technique
Author:
Affiliation:
1. Faculty of Science and Engineering, Ritsumeikan University
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering,Mechanical Engineering
Link
https://www.jstage.jst.go.jp/article/ieejsmas/126/7/126_7_330/_pdf
Reference11 articles.
1. (1) P. Bley and J. Mohr : “The LIGA Process - A Microfabrication Technology -”, Fed J., Vol. 5, No. 1, pp. 34-48 (1994-1)
2. (2) W. Ehrfeld and H. Lher : “Deep X-Ray Lithography for the Production of Three-Dimensional Microsystems from Metals, Polymers, Ceramics”, Radiat. Phys. Chem, Vol. 45, No. 3, pp. 340-365 (1995-3)
3. (3) Y. Somemura and K. Deguchi : “Effects of Fresnek Diffractio on Resolution and Linewidth Control in Synchrotron Radiation Lithography”, Jpn. J. Appl. Phys. Vol. 31, pp. 938-944 (1992)
4. (4) Y. Somemura, K. Deguchi, and K. Miyoshi : “Proximity Effect on Patterning Characteristics of Hole Patterns in Syinchrotron Radiation Lithography”, Jpn. J. Appl. Phys., Vol. 31, pp. 6046-6053 (1994)
5. (5) P. Bley and J. Mohr : “The LIGA Process - A Microfabrication Technology -”, FED J., Vol. 5, No. 1, pp. 34-48 (1994-1)
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