Stress Stability of W–Ti X-Ray Absorber in Patterning Process-Reference-Cited by-同舟云学术

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Stress Stability of W–Ti X-Ray Absorber in Patterning Process

Published:1999-12-30 Issue:Part 1, No. 12B Volume:38 Page:7080-7083
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kitamura Kaeko,Yabe Hideki,Ami Shigeto,Kise Koji,Aya Sunao,Marumoto Kenji,Satoh Shin-ichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Theoretical Analysis on Mechanical Deformation of Membrane-Based Photomask Blanks;Japanese Journal of Applied Physics;2012-04-03

2. Theoretical Analysis on Mechanical Deformation of Membrane-Based Photomask Blanks;Japanese Journal of Applied Physics;2012-04-01

3. Nanoarchitectonics: A Conceptual Paradigm for Design and Synthesis of Dimension-Controlled Functional Nanomaterials;Journal of Nanoscience and Nanotechnology;2011-01-01

4. Fabrication of high resolution x-ray masks using diamond membrane for second generation x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003

5. A New Cleaning Technique for X-Ray Masks in Alkaline Solutions by Direct Control of Electrochemical Potential;Japanese Journal of Applied Physics;2000-12-30

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