Characterization of a DC Arcjet Plasma for Diamond Growth by Measurement of Spatial Distributions of Optical Emission-Reference-Cited by-同舟云学术

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Characterization of a DC Arcjet Plasma for Diamond Growth by Measurement of Spatial Distributions of Optical Emission

Published:1996-04-15 Issue:Part 1, No. 4A Volume:35 Page:2306-2313
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yamaguchi Hiromi,Ishii Masahiro,Uematsu Kazuo,Morimoto Shinji

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical Emission from C2– Anions in Microwave-Activated CH4/H2 Plasmas for Chemical Vapor Deposition of Diamond;The Journal of Physical Chemistry A;2017-04-03

2. Diamond film deposition from ethylene glycol/water solution using a dc-plasma jet method;Diamond and Related Materials;2006-09

3. Measurements of C2 and CH concentrations and temperatures in a dc arc jet using cavity ring-down spectroscopy;Journal of Applied Physics;2002-10-15

4. Diamond deposition in a DC-arc Jet CVD system: investigations of the effects of nitrogen addition;Diamond and Related Materials;2001-03

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