Optical Emission from C2– Anions in Microwave-Activated CH4/H2 Plasmas for Chemical Vapor Deposition of Diamond
Author:
Affiliation:
1. School of Chemistry, University of Bristol, Bristol, U.K. BS8 1TS
2. Skobel’tsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Leninskie gory, Moscow 119991, Russia
Funder
Engineering and Physical Sciences Research Council
Element Six
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
http://pubs.acs.org/doi/pdf/10.1021/acs.jpca.7b00814
Reference94 articles.
1. Plasma diagnostics of a d.c. arcjet chemical vapor deposition diamond reactor
2. Plasma diagnostics of a direct‐current arcjet diamond reactor. II. Optical emission spectroscopy
3. Characterization of a DC Arcjet Plasma for Diamond Growth by Measurement of Spatial Distributions of Optical Emission
4. Optical diagnostics for temperature measurement in a DC arcjet reactor used for diamond deposition
5. Excited state density distributions of H, C, C2, and CH by spatially resolved optical emission in a diamond depositing dc-arcjet reactor
Cited by 29 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Heavily boron-doped polycrystalline diamond films: Microstructure, chemical composition investigation and plasma in-situ diagnostics;Applied Surface Science;2024-06
2. Explore the growth mechanism of high-quality diamond under high average power density in the MPCVD reactor;Materials Science and Engineering: B;2024-04
3. Understanding continuous wave laser-induced chemical reactions at micro- and nano-diamond-glass interface under infrared excitation;Materials Research Express;2023-09-01
4. Nucleation of Carbonaceous Nanoparticles in a Low Pressure Ar/C2H2 Plasma with C2H4 Impurity;The Journal of Physical Chemistry A;2023-08-09
5. Two-dimensional modeling of diamond growth by microwave plasma activated chemical vapor deposition: Effects of pressure, absorbed power and the beneficial role of nitrogen on diamond growth;Diamond and Related Materials;2023-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3