Diamond film deposition from ethylene glycol/water solution using a dc-plasma jet method-Reference-Cited by-同舟云学术

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Diamond film deposition from ethylene glycol/water solution using a dc-plasma jet method

Published:2006-09 Issue:9 Volume:15 Page:1314-1317
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Matsushima Yuta,Yamazaki Tsutomu,Maeda Kazuyuki,Noma Tatsuo,Suzuki Takeyuki

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Vapor growth of diamond on diamond and other surfaces

2. Vapor Deposition of Diamond Particles from Methane

3. Synthesis of Diamond by DC Plasma Chemical Vapor Deposition above the Surface of a Water-Ethylene Glycol Solution

4. DC-plasma-assisted synthesis of diamond and alumina using liquid

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ultra-high growth rate of boron-doped diamond films with optimized growth parameters using in-liquid microwave plasma CVD;Diamond and Related Materials;2023-12

2. Diamond coating on hard metals by traveling methods in a plasma-assisted chemical vapor deposition method above the liquid;Diamond and Related Materials;2010-10

3. A comparison of diamond growth rate using in-liquid and conventional plasma chemical vapor deposition methods;Journal of Applied Physics;2009-06

4. Synthesis of Diamond Using In-Liquid Plasma Chemical Vapor Deposition;Japanese Journal of Applied Physics;2009-03-23

5. Submerged synthesis of diamond in liquid alcohol plasma;Diamond and Related Materials;2008-11

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