Author:
Kaneko Takashi,Itabashi Seiichi,Saitoh Yasunao,Yoshihara Hideo,Kitayama Toyoki
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
9 articles.
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1. A beamline for photochemical processes at atmospheric pressure;Journal of Synchrotron Radiation;1998-05-01
2. Lithography for micro-electronics;Radiation Physics and Chemistry;1995-03
3. Efficient extraction window for high‐throughput x‐ray lithography beamlines;Review of Scientific Instruments;1995-02
4. Design of an aspheric mirror for synchrotron radiation X-ray lithography beamline;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1994-08
5. Synchrotron radiation beamline for x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-03