N-Polarity InN/GaN/InAlN High-Electron-Mobility Transistors
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/5/i=4/a=044101/pdf
Reference20 articles.
1. 300-GHz InAlN/GaN HEMTs With InGaN Back Barrier
2. Fully Passivated AlInN/GaN HEMTs With $f_{\rm T}/f_{\rm MAX}$ of 205/220 GHz
3. Transient electron transport in wurtzite GaN, InN, and AlN
4. Growth and Characterization of AlInN Ternary Alloys in Whole Composition Range and Fabrication of InN/AlInN Multiple Quantum Wells by RF Molecular Beam Epitaxy
5. Growth Optimization of an Electron Confining InN/GaN Quantum Well Heterostructure
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1. InN/InAlN heterostructures for new generation of fast electronics;Journal of Applied Physics;2024-06-25
2. Mg Doping of N-Polar, In-Rich InAlN;Materials;2023-03-10
3. Growth of N-polar In-rich InAlN by metal organic chemical vapor deposition on on- and off-axis sapphire;Materials Science in Semiconductor Processing;2023-03
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