Comparison of Plasma Parameters Measured in Inductively Coupled Ar/C4F8/O2and Ar/CF4/O2Plasmas
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
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1. Electron and negative ion dynamics in a pulsed 100 MHz capacitive discharge produced in an O2 and Ar/O2/C4F8 gas mixture;Plasma Sources Science and Technology;2020-03-13
2. Silicon Surface Modification Using C4F8+O2 Plasma for Nano-Imprint Lithography;Journal of Nanoscience and Nanotechnology;2015-11-01
3. A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications;Thin Solid Films;2015-03
4. Material Removal Rate Control in Open-Air Type Plasma Chemical Vaporization Machining Using Optical Actinometry;Key Engineering Materials;2012-11
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