Order of Reaction between Photoresist and Atomic Hydrogen Generated by a Tungsten Hot-Wire Catalyst
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/3/i=2/a=026501/pdf
Reference18 articles.
1. Reflection and Dissociation of H2 on Tungsten
2. Interaction of Hydrogen with Tungsten
3. Photoresist Removal using Atomic Hydrogen Generated by Heated Catalyzer
4. On the possibility of MBE growth interface modification by hydrogen
5. Low-temperature crystallization of amorphous silicon using atomic hydrogen generated by catalytic reaction on heated tungsten
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1. Photoactive Compounds Effects on Removal Rate for Polystyrene-type Polymers by H<sub>2</sub>/O<sub>2</sub> Mixture Activated by Hot Tungsten Wire;Journal of Photopolymer Science and Technology;2023-06-15
2. Effects of hydrogen radical treatment on piezoresistance coefficients of germanium;Applied Physics Express;2023-04-01
3. Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H2/O2 Mixtures Activated on a Tungsten Hot-wire Catalyst;Journal of Photopolymer Science and Technology;2021-06-11
4. Effects of Nitrogen Dilution on the Photoresist Removal Rate by Hydrogen Radicals;Journal of Photopolymer Science and Technology;2020-07-01
5. Removal of Surface Contamination by Atomic Hydrogen Annealing;Journal of Photopolymer Science and Technology;2020-07-01
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