Sensitivity of Process Parameters on Pattern Formation of Litho–Cure–Litho–Etch Process
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effects of Line-Edge Roughness on Extreme Ultraviolet Lithography CDs and Fin-Field-Effect-Transistor Performance for Below 10-nm Patterns;Journal of Nanoscience and Nanotechnology;2017-11-01
2. Physical Patterning Performance in the Modified Layer Extraction Rule with an Image Sensor Device;Journal of Nanoscience and Nanotechnology;2017-10-01
3. Impact of process parameters on pattern formation in the maskless plasmonic computational lithography;Current Applied Physics;2015-06
4. Impact of Process Parameters on Pattern Formation of the Self-Aligned Multiple Patterning Process;Journal of Nanoscience and Nanotechnology;2014-12-01
5. Modeling and Simulation of Patterning Diblock Copolymers Through Nanoimprint Lithography;Journal of Nanoscience and Nanotechnology;2014-08-01
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