Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors-Reference-Cited by-同舟云学术

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Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors

Published:1991-12-30 Issue:Part 1, No. 12B Volume:30 Page:3695-3699
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ahn Byung-Chul,Shimizu Kazuhiro,Satoh Tsutomu,Kanoh Hiroshi,Sugiura Osamu,Matsumura Masakiyo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 29 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Deposition of Intrinsic and Doped Semiconductor Thin Films for a-Si:H TFT;Thin Film Transistors;2004

3. Studies on structural and electrical properties of silicon nitride films deposited by unbalanced magnetron sputter deposition;Materials Science and Engineering: B;2002-03

4. Excimer-Laser-Produced Single-Crystal Silicon Thin-Film Transistors;Japanese Journal of Applied Physics;1997-10-15

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