Electron-enhanced atomic layer deposition of silicon thin films at room temperature-Reference-Cited by-同舟云学术

Electron-enhanced atomic layer deposition of silicon thin films at room temperature

Published:2018-01 Issue:1 Volume:36 Page:01A118
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Sprenger Jaclyn K.¹,Sun Huaxing¹,Cavanagh Andrew S.¹,George Steven M.²

Affiliation:

1. Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado 80309

2. Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado 80309 and Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309

Funder

DOD | Defense Advanced Research Projects Agency

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.5006696

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