Studies on structural and electrical properties of silicon nitride films deposited by unbalanced magnetron sputter deposition
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference43 articles.
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2. Effect of nitrogen mole fraction on hydrogenated amorphous silicon nitride deposited by DC magnetron sputtering: transition between metallic and reactive sputtering;physica status solidi (c);2014-09-17
3. Deposition of silicon nitride thin films by RF magnetron sputtering: a material and growth process study;Optical Materials;2012-02
4. Sol–gel processing of silicon nitride films from Si(NHMe)4 and ammonia;Journal of Materials Chemistry;2011
5. Comparative study of trap-limited hydrogen diffusion in amorphous SiC, Si0.66C0.33N1.33, and SiN1.33films;Journal of Physics: Condensed Matter;2006-05-26
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