Low-Temperature Formation of Epitaxial NiSi2Layers with Solid-Phase Reaction in Ni/Ti/Si(001) Systems-Reference-Cited by-同舟云学术

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Low-Temperature Formation of Epitaxial NiSi2Layers with Solid-Phase Reaction in Ni/Ti/Si(001) Systems

Published:2005-05-10 Issue:5A Volume:44 Page:2945-2947
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Nakatsuka Osamu,Okubo Kazuya,Tsuchiya Yoshinori,Sakai Akira,Zaima Shigeaki,Yasuda Yukio

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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