Step and Flash Imprint of Fluorinated Silicon-Containing Resist Materials for Three-Dimensional Nanofabrication
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
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1. High-resolution defect inspection of step-and-flash imprint lithography for 32-nm half-pitch patterning
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Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Large Area, Facile Oxide Nanofabrication via Step-and-Flash Imprint Lithography of Metal–Organic Hybrid Resins;ACS Applied Materials & Interfaces;2013-12-04
2. Direct Patterning of TiO2 Using Step-and-Flash Imprint Lithography;ACS Nano;2012-01-17
3. A “thiol-ene” photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL);J. Mater. Chem.;2012
4. Development of Ultraviolet Crosslinking Glucose-Based Resist Materials for Advanced Electronic Device Applications Using Nanoimprint Lithography;Japanese Journal of Applied Physics;2011-01-20
5. Development of Ultraviolet Crosslinking Glucose-Based Resist Materials for Advanced Electronic Device Applications Using Nanoimprint Lithography;Japanese Journal of Applied Physics;2011-01-01
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