A “thiol-ene” photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL)
Author:
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2012/JM/C1JM13765D
Reference47 articles.
1. Soft Lithography
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