Growth Behavior of an Adsorbed Monolayer from a Benzophenone-Containing Trimethoxysilane Derivative on a Fused Silica Surface for Nanoimprint Molds by Chemical Vapor Surface Modification-Reference-Cited by-同舟云学术

Growth Behavior of an Adsorbed Monolayer from a Benzophenone-Containing Trimethoxysilane Derivative on a Fused Silica Surface for Nanoimprint Molds by Chemical Vapor Surface Modification

Published:2010-06-21 Issue:6 Volume:49 Page:06GL03
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kubo Shoichi,Nakagawa Masaru

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference25 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Polymer Imprint Lithography with Molecular-Scale Resolution

3. Mold-assisted nanolithography: A process for reliable pattern replication

4. Room temperature replication in spin on glass by nanoimprint technology

5. Room Temperature Nanoimprint Technology Using Hydrogen Silsequioxane (HSQ)

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Evaluation of ultraviolet-nanoimprint-lithography release agent properties by using TriboIndenter;Microelectronic Engineering;2015-06

2. Super-resolution fluorescence imaging of nanoimprinted polymer patterns by selective fluorophore adsorption combined with redox switching;AIP Advances;2013-10

3. Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient;Japanese Journal of Applied Physics;2012-06-20

4. Morphological Changes in Ultraviolet-Nanoimprinted Resin Patterns Caused by Ultraviolet-Curable Resins Absorbing Pentafluoropropane;Japanese Journal of Applied Physics;2012-06-20

5. Silica/Ultraviolet-Cured Resin Nanocomposites for Replica Molds in Ultraviolet Nanoimprinting;Japanese Journal of Applied Physics;2012-06-20