Etching of Copper Films for Thin Film Transistor Liquid Crystal Display using Inductively Coupled Chlorine-Based Plasmas-Reference-Cited by-同舟云学术

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Etching of Copper Films for Thin Film Transistor Liquid Crystal Display using Inductively Coupled Chlorine-Based Plasmas

Published:2004-12-09 Issue:12 Volume:43 Page:8300-8303
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Jang Kyung Hwan,Lee Won Jeong,Kim Hyung Rae,Yeom Geun Young

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/43/i=12R/a=8300/pdf

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 64‐4: ECR Plasma Source for Copper Thin Film Dry Etching;SID Symposium Digest of Technical Papers;2024-06

2. 51‐3: Copper Thin Film Dry Etching Equipment via ECR Plasma Source;SID Symposium Digest of Technical Papers;2023-06

3. 55‐3: Development of Low‐Temperature Metal Dry‐Etching Equipment via ECR Plasma Source;SID Symposium Digest of Technical Papers;2022-06

4. A Flash‐Induced Robust Cu Electrode on Glass Substrates and Its Application for Thin‐Film μ LEDs;Advanced Materials;2021-02-26

5. General features of interaction between copper and chlorine-containing gases;High Energy Chemistry;2017-05

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