Gas-Phase Nucleation in GaAs Thin Film Preparation by Metal Organic Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Gas-Phase Nucleation in GaAs Thin Film Preparation by Metal Organic Chemical Vapor Deposition

Published:1992-01-15 Issue:Part 1, No. 1 Volume:31 Page:1-11
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Okuyama Kikuo,Huang David D.,Seinfeld John H.,Tani Naoyuki,Matsui Isao

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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