Visualization and numerical simulation of fine particle transport in a low-pressure parallel plate chemical vapor deposition reactor-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Visualization and numerical simulation of fine particle transport in a low-pressure parallel plate chemical vapor deposition reactor

Published:2002-02 Issue:3 Volume:57 Page:497-506
ISSN:0009-2509
Container-title:Chemical Engineering Science
language:en
Short-container-title:Chemical Engineering Science

Author:

Setyawan Heru,Shimada Manabu,Ohtsuka Kenji,Okuyama Kikuo

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference16 articles.

1. Adachi, M., & Okuyama, K. (1998). Particle deposition in air. in: Hattori (ed.), Ultraclean surface processing of silicon wafers: Secrets of VLSI manufacturing (pp. 67–81). Berlin: Springer.

2. Massively parallel simulations of Brownian dynamics particle transport in low pressure parallel-plate reactor;Choi;Journal of Vacuum Science and Technology A,1996

3. Postplasma particle dynamics in a gaseous electronic conference RF reference cell;Collins;Journal of Vacuum Science and Technology A,1995

4. Particle generation and thin film surface morphology in the tetraethylorthosilicate/oxygen plasma enhanced chemical vapor deposition process;Fujimoto;Journal of Applied Physics,2000

5. Fluid simulations of particle contamination in postplasma processes;Garrity;Journal of Vacuum Science and Technology A,1995

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Physics and applications of dusty plasmas: The Perspectives 2023;Physics of Plasmas;2023-12-01

2. Comparison of PECVD Temperature Control Methods;2022 2nd International Conference on Electrical Engineering and Control Science (IC2ECS);2022-12-16

3. Computational Fluid Dynamics Analysis of Particle Deposition Induced by a Showerhead Electrode in a Capacitively Coupled Plasma Reactor;Coatings;2021-08-23

4. Simulation and experimental verification study on the process parameters of ZnO-MOCVD;Ceramics International;2021-06

5. Numerical simulation and study of the metal-organic chemical vapor deposition growth of ZnO film;Physics of Fluids;2019-02

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3