Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5and the Effects on Electrical Properties ofIn situNitridation-Reference-Cited by-同舟云学术

Comparative Studies of Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition Ta2O5and the Effects on Electrical Properties ofIn situNitridation

Published:2007-05-17 Issue:5B Volume:46 Page:3224-3228
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Maeng Wan-Joo,Lee Jae-Woong,Myoung Jae-Min,Kim Hyungjun

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference16 articles.

1. Chemical vapor deposition of ultrathin Ta2O5 films using Ta[N(CH3)2]5

2. Ultrathin Ta2O5 films produced by large-area pulsed laser deposition

3. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges

4. Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors

5. Scaling the gate dielectric: Materials, integration, and reliability

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