Combinatorial Plasma Etching Process
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/2/i=9/a=096001/pdf
Reference6 articles.
1. Vacuum ultraviolet absorption spectroscopy employing a microdiacharge hollow-cathode lamp for absolute density measurements of hydrogen atoms in reactive plasmas
2. Development of vacuum ultraviolet absorption spectroscopy technique employing nitrogen molecule microdischarge hollow cathode lamp for absolute density measurements of nitrogen atoms in process plasmas
3. New model for electron‐impact ionization cross sections of molecules
4. Behavior of atomic radicals and their effects on organic low dielectric constant film etching in high density N2/H2 and N2/NH3 plasmas
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