Ion Beam Etching of InP. II. Reactive Etching with Halogen-Based Source Gases
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Plasma Processing of III-V Materials;Handbook of Advanced Plasma Processing Techniques;2000
2. Formation of dry etched gratings in GaN and InGaN;Journal of Electronic Materials;1997-03
3. Development of GaN and InGaN Gratings by Dry Etching;MRS Proceedings;1997
4. New dry-etch chemistries for III–V semiconductors;Materials Science and Engineering: B;1994-07
5. Comparison of plasma chemistries for patterning InP-based laser structures;Plasma Sources Science and Technology;1994-02-01
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