Ion Beam Etching of InP. II. Reactive Etching with Halogen-Based Source Gases

Author:

Yuba Yoshihiko,Gamo Kenji,He Xi Guan,Zhang Yu Shu,Namba Susumu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Plasma Processing of III-V Materials;Handbook of Advanced Plasma Processing Techniques;2000

2. Formation of dry etched gratings in GaN and InGaN;Journal of Electronic Materials;1997-03

3. Development of GaN and InGaN Gratings by Dry Etching;MRS Proceedings;1997

4. New dry-etch chemistries for III–V semiconductors;Materials Science and Engineering: B;1994-07

5. Comparison of plasma chemistries for patterning InP-based laser structures;Plasma Sources Science and Technology;1994-02-01

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