Author:
Lee J. W.,Hong J.,Mackenzie J. D.,Abernathy C. R.,Pearton S. J.,Ren F.,Sciortino P. F.
Abstract
ABSTRACTSub-micron periodic gratings with pitch ∼3,000Å were formed in GaN and InGaN using holographic lithography and room temperature ECR BCl3/N2 dry etching at moderate microwave (500W) and rf (100W) powers. The process produces uniform gratings without the need for elevated sample temperatures during the etch step.
Publisher
Springer Science and Business Media LLC