Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist-Reference-Cited by-同舟云学术

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Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist

Published:2006-07-07 Issue:7 Volume:45 Page:5735-5737
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Shigaki Takumi,Okamoto Kazumasa,Kozawa Takahiro,Yamamoto Hiroki,Tagawa Seiichi,Kai Toshiyuki,Shimokawa Tsutomu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study on deprotonation from radiation-induced ionized acrylate polymers including acid-generation promoters for improving chemically amplified resists;Japanese Journal of Applied Physics;2022-05-25

2. Theoretical study on effects of electron thermal energy on sensitization process of chemically amplified electron beam resists—contribution to resist heating effect in electron beam mask writing;Japanese Journal of Applied Physics;2019-10-24

3. Negative-tone imaging with EUV exposure toward 13nm hp;Extreme Ultraviolet (EUV) Lithography VII;2016-03-18

4. Novel EUV resist materials design for 14nm half pitch and below;SPIE Proceedings;2014-04-17

5. Novel EUV Resist Materials Design for 14 nm Half Pitch and below;Journal of Photopolymer Science and Technology;2014

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