Development of Materials and Processes for Non-top Coat Immersion Lithography-Reference-Cited by-同舟云学术

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Development of Materials and Processes for Non-top Coat Immersion Lithography

Published:2009 Issue:5 Volume:22 Page:619-623
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kobayashi Katsutoshi,Sho Kotaro,Kato Hirokazu,Iida Kazunori,Iwakaji Yoko,Ori Tomoya,Muto Daizo,Azuma Tsukasa,Ito Shinichi

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/22/5/22_5_619/_pdf

Reference4 articles.

1. 1. N. Matsumura, N. Sugie, K. Goto, K. Fujiwara and Y. Yamaguchi, H. Tanizaki, K. Nakano and T. Fujiwara, S. Wakamizu, H. Takeguchi, H. Arima, H. Kyoda, K. Yoshihara and J. Kitano, Proc. SPIE, 2008, 6923, 69230D (2008).

2. 2. K. Ohmori, T. Ando, T. Takayama, K. Ishizuka, M. Yoshida, Y. Utsumi, K. Endo, T. Iwai. Proc. SPIE, 6153, 61531X (2006).

3. Surface Property Control for 193nm Immersion Resist

4. 4. D. P. Sanders, L. K. Sundberg, R. Sooriyakumaran, P. J. Brock, R. A. Dipietro, H. D. Truong, D. C. Miller, M . C. Lawson, R. D. Allen, Proc. SPIE, 6519, 651904 (2007).

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Immersion-Specific Defects of High-Receding-Angle Topcoat;Japanese Journal of Applied Physics;2010-06-21

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