Surface Property Control for 193nm Immersion Resist-Reference-Cited by-同舟云学术

Surface Property Control for 193nm Immersion Resist

Published:2006 Issue:4 Volume:19 Page:565-568
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Irie Makiko,Endo Kotaro,Iwai Takeshi

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/19/4/19_4_565/_pdf

Reference4 articles.

1. K. Ohmori, T. Ando, H. Tsuji, M. Yoshida, K. Ishizuka, T. Hirano, and H. Yokoya, "Top coat investigation for immersion specific issue prevention", International Symposium of Immersion Lithography, Bruges (2005).

2. 2. K. Nakano, S. Nagaoka, S. Owa, and T. Yamamoto, "Defectively data taken with a full-field immersion exposure tool", International Symposium of Immersion Lithography, Bruges (2005).

3. 3. K. Ohmori, T. Ando, T. Takayama, K. Ishizuka, M. Yoshida, Y. Utsumi, K. Endo and T. Iwai, Proc. SPIE 6153 (2006) in press.

4. Effects of Protecting Group on Resist Characteristics of Acryl Polymers for 193 nm Lithography

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface property control for 193 nm immersion resist by addition of Si compound;Journal of Vacuum Science & Technology B;2023-01-01

2. Advances in Patterning Materials for 193 nm Immersion Lithography;Chemical Reviews;2010-01-13

3. Feasibility study of non-topcoat resist for 22nm node devices;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

4. Topcoat-free ArF negative tone resist;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

5. Development of Materials and Processes for Non-top Coat Immersion Lithography;Journal of Photopolymer Science and Technology;2009