Immersion-Specific Defects of High-Receding-Angle Topcoat-Reference-Cited by-同舟云学术

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Immersion-Specific Defects of High-Receding-Angle Topcoat

Published:2010-06-21 Issue:6 Volume:49 Page:066502
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Terai Mamoru,Kumada Teruhiko,Hagiwara Takuya,Hanawa Tetsuro,Ando Tomoyuki,Matsunobe Takeshi,Okada Kazuyuki,Muraji Yuichi,Yoshikawa Kazuhiro,Man Naoki

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference17 articles.

1. First microprocessors with immersion lithography

2. Characterization of ArF immersion process for production

3. Defect studies of resist process for 193nm immersion lithography

4. Control of the receding meniscus in immersion lithography

5. Development of ArF immersion exposure tool

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Formation of residual droplets upon dip-coating of chemical and topographical surface patterns on partially wettable substrates;Chemical Engineering Science;2020-12

2. Discontinuous pinning effect by a hole row to the gas-liquid interface in a parallel gap;Experimental Thermal and Fluid Science;2017-10

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