Materials and Processes of Negative Tone Development for Double Patterning Process-Reference-Cited by-同舟云学术

Materials and Processes of Negative Tone Development for Double Patterning Process

Published:2009 Issue:5 Volume:22 Page:635-640
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Tarutani Shinji,Tsubaki Hideaki,Kamimura Sou

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/22/5/22_5_635/_pdf

Reference15 articles.

1. 1. John Warlaumont: SEMATECH Litho Forum, (2008)

2. 2. Todd R. Younkin: SEMATECH Litho Forum, (2008)

3. 3. Hidefumi Mukai, Eishi Shiobara, Shinya Takahashi, Kohji Hashimoto: Proc. SPIE, 6924, (2008) 692406

4. 4. Hyun-Woo Kim, Myeong-Cheol Kim, Suk-Joo Lee, Don-Hwa Kwak, Hyung-Do Kim, Chang-Min Park, Dae-Yup Lee, Sung-Won Choi, Chang-Jin Kang, Woo-Sung Han: 5th International Symposium on Immersion Lithography Extensions, (2008) O-DP-01

5. 5. Chris Cork, Brian Ward, Levi Barnes, Ben Painter, Kevin Lucas, Gerry Luk-Pat, Vincent Wiaux, Staf Verhaegen, Mireille Maenhoudt: Proc. SPIE, 6925 (2008) 69251Q-1

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