1. Materials and Processes of Negative Tone Development for Double Patterning Process
2. Resist material for negative tone development process;Tarutani,2010
3. Printing the metal and contact layers for the 32- and 22-nm node: comparing positive and negative tone development process;Van Look,2010
4. Three-dimensional profile extraction from CD-SEM image and top/bottom CD measurement by line-edge roughness analysis;Yamaguchi,2009
5. Robust edge detection with considering three-dimensional sidewall feature by CD-SEM;Yamaguchi,2011