Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography-Reference-Cited by-同舟云学术

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Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography

Published:2012 Issue:5 Volume:25 Page:625-631
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kozawa Takahiro

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/25/5/25_625/_pdf

Reference31 articles.

1. 1. N. N. Matsuzawa, H. Oizumi, S. Mori, S. Irie, S. Shirayone, E. Yano, S. Okazaki, A. Ishitani, and D. A. Dixon, Jpn. J. Appl. Phys., 38 (1999) 7109.

2. 2. R. Hirose, T. Kozawa, S. Tagawa, T. Kai, and T. Shimokawa, Jpn. J. Appl. Phys., 46 (2007) L979.

3. 3. P. Dentinger, G. Cardinale, C. Henderson, A. Fisher, and A. Ray-Chaudhuri, Proc. SPIE, 3997 (2000) 588.

4. 4. T. Itani, Microelectron. Eng., 86 (2009) 207.

5. 10. S. Tarutani, H. Tamaoki, H. Tsubaki, T. Takahashi, H. Takizawa, H. Takahashi, and S.-J. Kang, J. Photopolym. Sci. Technol., 24 (2011) 185.

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