Perpendicularly-Oriented Block Copolymers Containing Silicon-Rich Hyperbranched Polymers for High Resistance to O<sub>2</sub>-RIE-Reference-Cited by-同舟云学术

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Perpendicularly-Oriented Block Copolymers Containing Silicon-Rich Hyperbranched Polymers for High Resistance to O₂-RIE

Published:2017 Issue:2 Volume:30 Page:191-196
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yamazaki Seina¹,Odashima Rin¹,Seshimo Takehiro²,Hayakawa Teruaki¹

Affiliation:

1. Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology

2. Tokyo Ohka Kogyo Co., Ltd.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/30/2/30_191/_pdf

Reference10 articles.

1. 1. S. J. Jeong, J. Y. Kim, B. H. Kim, H. S. Moon, and S. O. Kim, Mater. Today, 16 (2013) 468.

2. 2. T. Seshimo, R. Maeda, R. Odashima, Y. Takenaka, D. Kawana, K. Ohmori, and T. Hayakawa, Sci. Rep., 6 (2016) 19481.

3. 3. K. Asakawa and T. Hiraoka, Jpn. J. Appl. Phys., 41 (2002) 6112.

4. 4. H. S. Suh, H. Kang, P. F. Nealey, and K. Char, Macromolecules, 43 (2010) 4744.

5. 5. S. Wu, J. Phys. Chem., 7 (1970) 632.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An experimental and theoretical investigation into the self-assembly of a chemically modified high-χ coil–rod diblock copolymer;RSC Advances;2022

2. Synthesis and Morphology Studies of Polysiloxane-based Triblock Copolymers;Journal of Photopolymer Science and Technology;2020-01-31

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