Thickness Dependence of Neutral Parameter Windows for Perpendicularly Oriented Block Copolymer Thin Films-Reference-Cited by-同舟云学术

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Thickness Dependence of Neutral Parameter Windows for Perpendicularly Oriented Block Copolymer Thin Films

Published:2010-04-26 Issue:10 Volume:43 Page:4744-4751
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Suh Hyo Seon¹²,Kang Huiman³,Nealey Paul F.³,Char Kookheon¹²

Affiliation:

1. Interdisciplinary Program in Nano-Science and Technology

2. Center for Functional Polymer Thin Films and School of Chemical and Biological Engineering

3. Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ma100150j

Reference37 articles.

1. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter

2. Lithography with a mask of block copolymer microstructures

3. Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock Copolymer Templates

4. Nanostructure fabrication using block copolymers

5. Enabling nanotechnology with self assembled block copolymer patterns

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2. Material and process optimization for EUV pattern rectification by DSA;Novel Patterning Technologies 2024;2024-04-09

3. Ionic Liquid Mediated One-Step Perpendicular Assembly in Block Copolymer Thin Films for Ultrafiltration Membrane Applications;2024

4. Wetting Behavior of A-block-(B-random-C) Copolymers with Equal Block Surface Energies on Surfaces Functionalized with B-random-C Copolymers;Langmuir;2023-10-02

5. A Universal Approach to Fabricating 3D Chemical Patterns for Directed Self-Assembly of Block Copolymers with Density Multiplication;Macromolecules;2023-07-26

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