Author:
Verstraete Lander,Suh Hyo Seon,Van Bel Julie,Bak Byeong-U,Kim Seong Eun,Vallat Remi,Bezard Philippe,Beggiato Matteo,Beral Christophe
Reference11 articles.
1. Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore’s Law;Ito,2008
2. Fundamentals of resist stochastics effect for single-exposure EUV patterning;De Silva,2019
3. Absorption coefficient of metal-containing photoresists in the extreme ultraviolet;Fallica;J. Mirco/Nanolith. MEMS MOEMS,2018
4. Photoacid generator–polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography
5. Remediation of Line Edge Roughness in Chemical Nanopatterns by the Directed Assembly of Overlying Block Copolymer Films
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