A Novel Platform for Production-worthy ArF Resist-Reference-Cited by-同舟云学术

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A Novel Platform for Production-worthy ArF Resist

Published:2001 Issue:3 Volume:14 Page:363-371
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kim Hyun-Woo,Choi Sang-Jun,Jung Dong-Won,Lee Sook,Lee Sung-Ho,Kang Yool,Woo Sang-Gyun,Moon Joo-Tae,Kavanagh Robert,Barclay George,Orsula George,Mattia Joe,Caporale Stefan,Adams Tim,Tanaka Tsutomu,Kang Doris

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/14/3/14_3_363/_pdf

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The development of laser-produced plasma EUV light source;Chip;2022-09

2. Investigating the optimum parameters of a negative photoresist to prepare a V-grooved diffraction grating on Si using photolithography and reactive ion etching techniques;Ceramics International;2021-04

3. Patterning by Photolithography;Functional Polymer Films;2011-06-07

4. Synthesis and lithographic evaluation of poly[(methacrylic acid tert-butyl cholate ester)-co-(γ-butyrolactone-2-yl methacrylate)];Polymer;2004-07

5. Evaluation of Post Dry-etching Roughness in ArF Resists by Spectroscopic Ellipsometry Analysis;Journal of Photopolymer Science and Technology;2003

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