Synthesis and lithographic evaluation of poly[(methacrylic acid tert-butyl cholate ester)-co-(γ-butyrolactone-2-yl methacrylate)]
Author:
Publisher
Elsevier BV
Subject
Polymers and Plastics,Materials Chemistry,Organic Chemistry
Reference14 articles.
1. A Novel Polymer for a 193-nm Resist.
2. New Protective Groups in Alicyclic Methacrylate Polymers for 193-nm Resists.
3. A Novel Platform for Production-worthy ArF Resist
4. Design of cycloolefin-maleic-anhydride resist for ArF lithography
5. Poly(t-butyl-3α-(5-norbornene-2-carbonyloxy)-7α,12α-dihydroxy-5β-cholan-24-oate-co-maleic anhydride) for a 193-nm photoresist
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1. Photo-sensitive bio-based copolymer containing cholic acids: novel functional materials for 248nm photoresist;Journal of Polymer Research;2018-08-02
2. Photoactivation of fluorescence of rhodamine dyes in the presence of haloalkanes;Russian Chemical Bulletin;2013-05
3. Synthesis of polymers with a norbornane backbone by radical copolymerization of alkyl 2-norbornene-2-carboxylates for photoresist applications;Polymer Journal;2012-11-14
4. Nonchemically amplified resists possessing cholate moiety for micropatterning of biomolecules;Microelectronic Engineering;2011-01
5. Enzymatic acrylation of 2-hydroxy-γ-butyrolactone to synthesize the gamma butyrolactone methacrylate (GBLMA) for photoresist;Biotechnology and Bioprocess Engineering;2010-04
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