Evaluation of Post Dry-etching Roughness in ArF Resists by Spectroscopic Ellipsometry Analysis-Reference-Cited by-同舟云学术

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Evaluation of Post Dry-etching Roughness in ArF Resists by Spectroscopic Ellipsometry Analysis

Published:2003 Issue:4 Volume:16 Page:517-522
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yamanaka Ryoko,Gotoh Yasushi,Tanaka Toshihiko

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/16/4/16_4_517/_pdf

Reference10 articles.

1. 1. T. Ofuji, et al.: Ext. Abstr. 45th Spring Meet. Japan Society of Applied Physics and Related Societies No.2 29p-YL-3, March (1998) p719 (in Japanese).

2. Alicyclic polymer for ArF and KrF excimer resist based on chemical amplification

3. 3. M. Takimoto, et al.: Ext. Abstr. 60th Autumn Meet. Japan Society of Applied Physics No.2 1p-H-10, September (1999) p583 (in Japanese).

4. 4. Y. Kimura, et al.: Ext. Abstr. 57th Autumn Meet. Japan Society of Applied Physics No.2 7p-S-10, September (1996) p479 (in Japanese).

5. 5. I. Okabe, T. Itani, H. Morimoto: Ext. Abstr. 47th Spring Meet. Japan Society of Applied Physics and Related Societies No.2 28p-F-8, March (2000) p693 (in Japanese).

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