Author:
Sewell Harry,McCafferty Diane,Wagner Christian,Markoya Louis
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Cited by
6 articles.
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1. Advances in Patterning Materials for 193 nm Immersion Lithography;Chemical Reviews;2010-01-13
2. Immersion Lithography: Photomask and Wafer-Level Materials;Annual Review of Materials Research;2009-08-01
3. All-dry photoresist systems: physical vapor deposition of molecular glasses;Advances in Resist Materials and Processing Technology XXV;2008-03-14
4. Leaching mechanisms in immersion lithography with or without top coat;Microelectronic Engineering;2007-05
5. Unconventional methods for forming nanopatterns;Proceedings of the Institution of Mechanical Engineers, Part N: Journal of Nanoengineering and Nanosystems;2006-09-01