Advanced Polymers and Resists-A Key to the Development of Nanoimprint Lithography-Reference-Cited by-同舟云学术

Advanced Polymers and Resists-A Key to the Development of Nanoimprint Lithography

Published:2005 Issue:4 Volume:18 Page:525-530
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Reuther Freimut

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/18/4/18_4_525/_pdf

Reference6 articles.

1. Nanoimprint lithography

2. Novel linear and crosslinking polymers for nanoimprinting with high etch resistance

3. New polymer materials for nanoimprinting

4. 4. F. Reuther, M. Fink, M. Kubenz, C. Schuster, M. Vogler, G. Gruetzner, 30st International Conference on Micro- and Nano-Engineering 2004, 19-22 September 2004, Rotterdam, The Netherlands

5. 5. K. Pfeiffer, M. Fink, G. Gruetzner, G. Bleidiessel, H. Schulz, H. Scheer, Microelectron. Eng. 5758 (2001), 381

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