Innovative and Tailor-made Resist and Working Stamp Materials for Advancing NIL-based Production Technology-Reference-Cited by-同舟云学术

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Innovative and Tailor-made Resist and Working Stamp Materials for Advancing NIL-based Production Technology

Published:2013 Issue:1 Volume:26 Page:119-124
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Schleunitz Arne,Vogler Marko,Fernandez-Cuesta Irene,Schift Helmut,Gruetzner Gabi

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/26/1/26_119/_pdf

Reference23 articles.

1. 1. H. Schift, S. Park and J. Gobrecht, J. Photopolym. Sci. Technol., 16 (2003) 435-438.

2. 2. A. Klukowska et al., Proc. of 24th European Mask and Lithography Conference EMLC2008, Dresden, Germany, January 21-24 (2008).

3. 3. H. Schift et al., J. Vac. Sci. Technol. B, 27 (2009) 2846-2849.

4. 4. H. Schift et al., Nanotechnology, 16 (2005) S171.

5. 5. C. Pina-Hernandez et al., Nanotechnology, 24 (2013) 065301.

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