Impact of developers on roughness of dissolution front in electron-beam resists
Author:
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
http://www.jstage.jst.go.jp/article/photopolymer/17/4/17_4_557/_pdf
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5. Quantitative factor analysis of resolution limit in electron beam lithography using the edge roughness evaluation method
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3. Study of Development Processes for ZEP-520 as a High-Resolution Positive and Negative Tone Electron Beam Lithography Resist;Japanese Journal of Applied Physics;2012-06-20
4. Study of Development Processes for ZEP-520 as a High-Resolution Positive and Negative Tone Electron Beam Lithography Resist;Japanese Journal of Applied Physics;2012-06-01
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