Aerial image contrast using interferometric lithography: effect on line-edge roughness-Reference-Cited by-同舟云学术

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Aerial image contrast using interferometric lithography: effect on line-edge roughness

Published:1999-06-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Sanchez Martha I.,Hinsberg William D.,Houle Frances A.,Hoffnagle John A.,Ito Hiroshi,Nguyen Cattien V.

Publisher

SPIE

Cited by 77 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advancements in EUV photoresists for high-NA lithography;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

2. Empirical correlator for stochastic local CD uniformity in extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-07-01

3. Progress in EUV-interference lithography resist screening towards the deployment of high-NA lithography;Extreme Ultraviolet (EUV) Lithography XII;2021-03-29

4. Image blur investigation using EUV-interference lithography;Extreme Ultraviolet Lithography 2020;2020-11-30

5. An analysis of EUV resist stochastic printing failures;International Conference on Extreme Ultraviolet Lithography 2019;2019-09-26

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